The signed Strategic Partnership Agreement extends the existing strategic partnership between imec and ZEISS, which has been in place since 2019, until 2029.

"We are very pleased to intensify our collaboration with imec to jointly advance the semiconductor technologies of tomorrow with its strong partner network,"

Since 1997, imec and the ZEISS segment Semiconductor Manufacturing Technology have been working on various joint projects to further develop Moore's Law, which continues to drive the ongoing increase in the performance of microchips and memory processors.

This long-standing collaboration has been instrumental in pushing the boundaries of semiconductor technology and maintaining the industry's momentum.

"For the research and development of cutting-edge semiconductor technologies, the expertise and technological experience of industry partners like ZEISS is essential. Therefore, we are very pleased to strengthen our partnership even further,"

With the signed agreement, the two cooperation partners reaffirm their joint efforts to advance key semiconductor manufacturing technologies such as High-NA-EUV lithography. This technology will enable the production of even more powerful and energy-efficient microchips, which are the foundation for key technologies such as artificial intelligence, autonomous driving, Industry 4.0, and groundbreaking solutions for medical technology and the energy transition. The partnership's focus on High-NA-EUV lithography represents a crucial step forward in achieving unprecedented levels of precision and efficiency in semiconductor manufacturing.

As part of the agreement, ZEISS supports imec not only by participating in research projects to advance manufacturing, process, and measurement technologies for semiconductor manufacturing but also by providing lithography optics, integrated into the lithography scanner systems of the strategic partner ASML, of various product generations for imec's pilot line, which is an essential part of the cooperation.

This comprehensive support enables imec to maintain its position as a leading research center for semiconductor innovation, facilitating breakthrough developments that benefit the entire industry. The integration of ZEISS's advanced lithography optics with ASML's scanner systems creates a powerful technological foundation for pushing the boundaries of semiconductor manufacturing capabilities.

Imec's pilot line, now being expanded with the state-of-the-art NanoIC pilot line in Leuven, Belgium, represents a comprehensive ecosystem that encompasses the complete value creation process and multiple technology strands essential for cutting-edge semiconductor manufacturing. This advanced facility serves as a crucial nexus where industry stakeholders, including end customers, equipment suppliers, and research institutions, can access pioneering semiconductor technologies and platforms.

This access enables these stakeholders to conduct extensive exploration, development, and testing of breakthrough innovations in a controlled, world-class environment. The facility's capabilities extend beyond basic research and development, incorporating sophisticated optimization protocols for existing equipment, manufacturing processes, and measurement methodologies.

These optimizations are strategically designed to facilitate the development of increasingly miniaturized, more powerful, and energy-efficient microchips, which are fundamental to advancing global digitalization initiatives across industries.

The strategic collaboration gains additional depth through ZEISS's active participation in various high-impact industry partner programs under imec's leadership. These programs, including Advanced Patterning, 3D System Integration, and Optical Interconnect, represent critical areas of technological advancement.

Within these collaborative frameworks, teams of experts work synergistically to develop and refine cutting-edge process and inspection methodologies, specifically targeting process optimizations for next-generation semiconductor technologies. This collaborative approach ensures a comprehensive and integrated development pathway for future semiconductor innovations.

The strategic alliance between imec and ZEISS demonstrates perfect alignment with the European Union's broader technological objectives and the specific mandates outlined in the European Chips Act. This alignment focuses on strengthening Europe's technological sovereignty, enhancing its competitive position in the global market, and building robust resilience in the semiconductor supply chain.

"With the investments in imec's pilot line, now being expanded with the NanoIC pilot line, ZEISS is significantly contributing to maintaining Europe's lead in the latest generation of semiconductor equipment and further expanding it through the development of technology roadmaps,"

The reinforced partnership between these two industry leaders sends a powerful message about the critical importance of cross-industry collaboration and integration in the global semiconductor marketplace. This collaboration exemplifies how strategic partnerships can drive innovation and technological advancement in the semiconductor industry.

"This strategic partnership between imec and ZEISS underscores how strong cohesion among European partners, which is crucial in setting up the NanoIC pilot line, the most advanced infrastructure for sub-2nm research and development in the world, accelerates innovation and strengthens Europe's leadership position in the semiconductor ecosystem,"

The partnership represents a significant step forward in establishing Europe as a global leader in semiconductor research, development, and manufacturing capabilities.